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Naura Releases Next-Generation 12-Inch NMC612H Inductively Coupled Plasma (ICP) Etching Equipment
People’s Financial News, March 25 — Recently, North Huachuang officially launched the new generation 12-inch high-end inductively coupled plasma (ICP) etching equipment — NMC612H. This device focuses on key etching process requirements in the fields of advanced logic and advanced storage, overcoming multiple technical challenges such as new precise bias voltage control, RF multi-pulse control, and ultra-high-speed communication network control.